reactive sputtering control in hipims

R e a c t i v e s p u t t e r i n g c o n t r o l i n H I P I M S

Dr. Iván Fernández Martínez

P r o c e s s s t a b i l i z a t i o n i n r e a c t i v e H i P I M S

Standard processes may not work, such as PEM or I-V average control

V. Bellido-Gonzalez, Surf. Coat. Technol . 204 (2010) 2159

HIPIMS PMT

Ti (400mm2) Ar + Nitrogen Constant Average Power 3kW 120us – 500Hz Ipeak : 220 – 500A peak

I=220A

Metallic zone

I=500A Poisoned zone


660

720

780

840

Targ

et v

olta

ge (V

)

N2 f

low

rate

(scc

m)

0

5

10

I=500A

Poisoned mode

660

720

780

840

Targ

et v

olta

ge (V

)

N2 f

low

rate

(scc

m)

0

5

10

I=220A Metallic mode


Mass spectrometry / reactive gas [Sproul, Thin Solid Films 491 (2005)1]

Pulsing reactive gas flow [Vlček , Surf. Coat. Technol. 236 (2013) 550]

Partial pressure / adjust average power [Sittinger, Thin Solid Films 516 (2008 ) 5847]

Adjusting average discharge current [Weichart U.S. Patent application No. 2009071667 (A1)]

Peak current / adjust frequency [D.Lundin J. Phys. D: Appl. Phys. 49 (2016) 065202]

Peak PEM / reactive gas [Bellido-Gonzalez, Surf. Coat. Technol 204 (2010) 2159]

P r o c e s s s t a b i l i z a t i o n i n r e a c t i v e H I P I M S

Stabilization during Pulse-ON phase

Peak current Peak plasma emission

Ipeak=580A

For a specific wavelength (optical filter)

H a r d w a r e u s e d f o r e x p e r i m e n t s

With HIPIMS option (optical and electrical)

Planar rectangular magnetron (400x100mm2) Ti, Al targets N,O reactive gas

N e w J o i n t v e n t u r e

6kW DC + HIPIMS Max. I pulse peak : 500A Max. V pulse peak : 1.2kV

w w w . h i P V . e u Vendor Innovators Showcase – Thursday May 12 V-15 hiP-V: A New HiPIMS Power Supply Technology - G. Eichenhofer

H i P I M S yo u r s y s te m

T h e n e w i n d u s t r i a l H i P I M S P S t e c h n o l o g y !

•F l e x i b l e •R e l i a b l e •M o d u l a r •M u l t i - F u n c t i o n a l

The All in ONE

H PIMS-PS

A c o l l a b o r a t i o n o f

B o o t h 4 3 7 B o o t h 5 0 6

SpeedFlo HIPIMS mode 520nm optical filter 480 500 520

0

20

40

Metallic mode (Ti) Poisoned mode (Ti + N)

Inte

nsity

(a.u

.)Wavelength (nm)

300 350 400 4500

20

40

Metallic mode (Ti) Poisoned mode (Ti + N)

Inte

nsity

(a.u

.)

Wavelength (nm)

Highly ionized Ti remains constant 320nm filter not useful

P l a s m a e m i s s i o n l i n e s T i + N

Ti (400mm2) Ar + Nitrogen Constant Average Power 3kW 120us – 500Hz Ipeak : 220 – 500A peak

520nm optical filter available

H I P I M S T i N c o a t i n g s : p l a s m a d y n a m i c s

45% 35% 25%

Ti (400mm2) Ar = 110sccm, Nitrogen = 26sccm Constant Average Power 1.5kW TON = 100us

200 300 400 500

150

200

250

300

Ipea

k (A

)

Ipeak

Sens

or (V

)

Frequency (Hz)0

2

4

6

8

10

PMT Sensor

H I P I M S T i N c o a t i n g s : p l a s m a d y n a m i c s

45% 35% 25%

Ti (400mm2) Ar = 110sccm, Nitrogen = 0sccm Constant Average Power 1.5kW Frequency = 300Hz

60 80 100 120 140125

150

175

200

225

Ipea

k (A

)

Ipeak

Sens

or (V

)

Time ON (us)

6.3

6.6

6.9 PMT Sensor

660

720

780

840

Targ

et v

olta

ge (V

)

N2 f

low

rate

(scc

m)

0

5

10

15

20

40

60

80

100

PMT

Sens

or s

igna

l (%

)

N2 f

low

rate

(scc

m)

0

5

10

15

P l a s m a e m i s s i o n l i n e s T i + N

No feedback control possible

H I P I M S T i N c o a t i n g s : f e e d b a c k c o n t r o l

0 1000 2000 3000 4000

20

40

60 Sensor PMT

Sign

al (%

)

t (s)0

4

8

12

16

20 Actuator Nitrogen

Nitr

ogen

flow

(scc

m)

50 100 150

20

40

60

80

Nitro

gen

flow

(scc

m)

PMT

Sens

or s

igna

l (%

)

0246810

Time (sec)

45% SetPoint 35% 25%

Ti (400mm2) Ar + Nitrogen Constant Average Power 3kW 120us – 500Hz Ipeak : 220 – 500A peak 1hr deposition

H I P I M S T i N c o a t i n g s : f e e d b a c k c o n t r o l Nitrogen flow at setpoint 45% ~ 4.5 sccm 35% ~ 5.5 sccm 25% ~ 7.0 sccm

Setpoint [%] 45 35 25

Hardness [GPa] 22.0 22.5 17.5

Dep. Rate [µm/hr] 3.7 3.7 3.5


45% SetPoint 35% 25% Ti (400mm2) Ar + Nitrogen Constant Average Power 3kW 120us – 500Hz Ipeak : 220 – 500A peak

RT deposition Floating potential

400 600 8000

20

40

Metallic mode (Al) Poisoned mode (Al + O)

Sign

al in

tens

ity (

a.u.

)

Wavelength (nm)

300 320 340

0

10

20

30 Metallic mode (Al) Poisoned mode (Al + O)

Sign

al in

tens

ity (

a.u.

)Wavelength (nm)

387 396 4050

20

40

Metallic mode (Al) Poisoned mode (Al + O)

Sign

al in

tens

ity (

a.u.

)

Wavelength (nm)

H I P I M S r e a c t i v e c o n t r o l A l - O

2kW 35us – 1kHz Ar flow 150sccm O2 flow 15sccm

10203040506070 400nm emission signal

Sens

or s

igna

l (%

)

500

600

700

800

900

1000 Sensor (V)

Targ

et v

olta

ge (V

)

0

2

4

Ramp

Oxy

gen

flow

(scc

m)

H I P I M S r e a c t i v e c o n t r o l A l - O

2kW average power 35us – 1kHz Ar flow 150sccm O2 flow 15sccm

H I P I M S T i N c o a t i n g s : p o s i t i v e r e v e r s a l

Floating Bias

With positive voltage reversal

Peak current Ipeak=580A

Target

Heuréka Session– Tuesday May 10 6:10 p.m. H-3 Tribomechanical properties of DLC deposited by magnetron sputtering on metallic and insulating substrates. I.Fernandez-Martinez

Setpoint [%] 45 45

Hardness [GPa] 22.0 13

POSITIVE YES NO


Floating Bias

With positive voltage reversal Without positive voltage reversal

Peak current

Floating Bias

Peak current

S u m m a r y

P e a k i n t e n s i t y s i g n a l s f o r p r o c e s s s t a b i l i z a t i o n .

P e a k c u r r e n t s t a b i l i z a t i o n a l s o p o s s i b l e , o n g o i n g e x p e r i m e n t s .

I p r o m i s e d D u a l M a g n e t r o n …

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reactive sputtering control in hipims

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